Invention Grant
- Patent Title: Semiconductor pressure sensor, method for producing the same, semiconductor device, and electronic apparatus
- Patent Title (中): 半导体压力传感器及其制造方法,半导体装置及电子设备
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Application No.: US12328991Application Date: 2008-12-05
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Publication No.: US07829960B2Publication Date: 2010-11-09
- Inventor: Teruo Takizawa
- Applicant: Teruo Takizawa
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2007-318885 20071210
- Main IPC: H01L29/82
- IPC: H01L29/82

Abstract:
A semiconductor pressure sensor includes: a first substrate; a buried insulating film laminated on the first substrate; a second substrate laminated on the buried insulating film; a plurality of electrodes including a lower electrode and at least two upper electrodes, the lower electrode being formed on the second substrate; and a piezoelectric film laminated on the lower electrode and having the upper electrodes formed thereon. In the sensor, there is removed at least a portion of a region of the first substrate corresponding to a region of the second substrate including the piezoelectric film and the electrodes.
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