Invention Grant
- Patent Title: Semiconductor apparatus
- Patent Title (中): 半导体装置
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Application No.: US12314518Application Date: 2008-12-11
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Publication No.: US07829971B2Publication Date: 2010-11-09
- Inventor: Hiroki Sone , Akira Yamada , Satoshi Shiraki , Nozomu Akagi
- Applicant: Hiroki Sone , Akira Yamada , Satoshi Shiraki , Nozomu Akagi
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2007-323064 20071214; JP2008-112483 20080423
- Main IPC: H01L25/16
- IPC: H01L25/16 ; H01L23/495

Abstract:
A semiconductor apparatus is disclosed. The semiconductor apparatus includes an SOI substrate including an active layer, a buried insulation film and a support substrate; a low potential reference circuit part located in the active layer and operable at a first reference potential; a high potential reference circuit part located in the active layer and operable at a second reference potential; a level-shifting element forming part located in the active layer and for providing a level-shift between the first and second reference potentials; and an insulation member insulating first and second portions of the support substrate from each other, wherein locations of the first and second portions respectively correspond to the low and high potential reference circuit parts.
Public/Granted literature
- US20090152668A1 Semiconductor apparatus Public/Granted day:2009-06-18
Information query
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