Invention Grant
- Patent Title: Edge termination structure for semiconductor components
- Patent Title (中): 半导体元件的边缘端接结构
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Application No.: US11683788Application Date: 2007-03-08
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Publication No.: US07829972B2Publication Date: 2010-11-09
- Inventor: Franz Hirler , Holger Kapels
- Applicant: Franz Hirler , Holger Kapels
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Coats & Bennett, P.L.L.C.
- Priority: DE102006011567 20060310
- Main IPC: H01L29/00
- IPC: H01L29/00

Abstract:
A semiconductor component has a drift path (4) in a semiconductor body (5) of a semiconductor chip (6). The semiconductor component has an edge area (7) and a cell area (8), which is surrounded by the edge area (7). A trench structure (9), which surrounds the semiconductor component (6) in the edge area (7), is arranged in the edge area (7) of the semiconductor component (6). At least the trench walls (10) are covered by an insulation material (11). The trench structure (9) which surrounds the semiconductor component (6) has overlapping trench zones (12) with semiconductor material (13) arranged between them.
Public/Granted literature
- US20070210410A1 Edge Termination Structure For Semiconductor Components Public/Granted day:2007-09-13
Information query
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