Invention Grant
- Patent Title: Cu-Mo substrate and method for producing same
- Patent Title (中): Cu-Mo基板及其制造方法
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Application No.: US11915201Application Date: 2006-05-23
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Publication No.: US07830001B2Publication Date: 2010-11-09
- Inventor: Masayuki Yokota , Kazuhiro Shiomi , Fumiaki Kikui , Masaaki Ishio
- Applicant: Masayuki Yokota , Kazuhiro Shiomi , Fumiaki Kikui , Masaaki Ishio
- Applicant Address: JP Osaka
- Assignee: Neomax Materials Co., Ltd.
- Current Assignee: Neomax Materials Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Nixon Peabody LLP
- Agent Marc W. Butler
- Priority: JP2005-149232 20050523
- International Application: PCT/JP2006/310223 WO 20060523
- International Announcement: WO2006/126525 WO 20061130
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A Cu—Mo substrate 10 according to the present invention includes: a Cu base 1 containing Cu as a main component; an Mo base having opposing first and second principal faces 2a, 2b and containing Mo as a main component, the second principal face 2b of the Mo base 2 being positioned on at least a portion of a principal face 1a of the Cu base 1; and a first Sn—Cu-type alloy layer 3 covering the first principal face 2a and side faces 2c and 2d of the Mo base 2, the first Sn—Cu-type alloy layer 3 containing no less than 1 mass % and no more than 13 mass % of Sn.
Public/Granted literature
- US20090045506A1 Cu-Mo SUBSTRATE AND METHOD FOR PRODUCING SAME Public/Granted day:2009-02-19
Information query
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