Invention Grant
- Patent Title: Seed layer for reduced resistance tungsten film
- Patent Title (中): 种子层用于降低阻力的钨膜
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Application No.: US12165176Application Date: 2008-06-30
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Publication No.: US07830016B2Publication Date: 2010-11-09
- Inventor: Mark Meldrim , Allen Mcteer , Alain P. Blosse
- Applicant: Mark Meldrim , Allen Mcteer , Alain P. Blosse
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Cool Patent, P.C
- Agent Joseph P. Curtin
- Main IPC: H01L21/44
- IPC: H01L21/44

Abstract:
Briefly, a memory device comprising a beta phase tungsten seed layer is disclosed.
Public/Granted literature
- US20090321943A1 SEED LAYER FOR REDUCED RESISTANCE TUNGSTEN FILM Public/Granted day:2009-12-31
Information query
IPC分类: