Invention Grant
- Patent Title: Surface emitting type optical semiconductor device
- Patent Title (中): 表面发射型光半导体器件
-
Application No.: US12191181Application Date: 2008-08-13
-
Publication No.: US07830937B2Publication Date: 2010-11-09
- Inventor: Mitsuhiro Kushibe , Mizunori Ezaki , Rei Hashimoto , Michihiko Nishigaki
- Applicant: Mitsuhiro Kushibe , Mizunori Ezaki , Rei Hashimoto , Michihiko Nishigaki
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Turocy & Watson, LLP
- Priority: JP2005-102036 20050331
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
It makes possible to inject a current into the current confinement region substantially uniformly. A surface emitting type optical semiconductor device includes a semiconductor active layer provided above a substrate; a first and second reflecting mirror layers sandwiching the semiconductor active layer to form an optical cavity in a direction perpendicular to the substrate; a plurality of current confinement regions provided in the second reflecting mirror layer so as to be separated by an impurity region having impurities; a semiconductor current diffusion layer provided on the second reflecting mirror layer so as to cover the current confinement regions; and an electrode portion which injects a current into the semiconductor active layer. The electrode portion comprising a first electrode provided on the semiconductor current diffusion layer so as to surround the current confinement regions and a second electrode provided on an opposite side of the substrate from the semiconductor active layer.
Public/Granted literature
- US20080317081A1 SURFACE EMITTING TYPE OPTICAL SEMICONDUCTOR DEVICE Public/Granted day:2008-12-25
Information query