Invention Grant
- Patent Title: Process control system, process control method, and method of manufacturing electronic apparatus
- Patent Title (中): 过程控制系统,过程控制方法和制造电子设备的方法
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Application No.: US12458421Application Date: 2009-07-10
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Publication No.: US07831330B2Publication Date: 2010-11-09
- Inventor: Junji Sugamoto , Yukihiro Ushiku , Kazutaka Akiyama , Shoichi Harakawa
- Applicant: Junji Sugamoto , Yukihiro Ushiku , Kazutaka Akiyama , Shoichi Harakawa
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2005-180659 20050621; JP2005-272019 20050920
- Main IPC: G06F19/00
- IPC: G06F19/00

Abstract:
A process control system includes a client computer which prepares a correlation between a reference monitored value of apparatus information and a feature quantity, a manufacturing execution system which prepares a processing recipe describing, as a first setting value in an actual manufacturing process, a value of the control parameter, an apparatus information collection section which collects an objective monitored value of the apparatus information in operation of the actual manufacturing process with the first setting value, a feature quantity calculation section which calculates a value of a feature quantity corresponding to the objective monitored value based on the correlation, a parameter calculation section which calculates a second setting value in the actual manufacturing process on the basis of the value of the feature quantity, and an apparatus control unit which changes the processing recipe with the second setting value being as a setting value of the second step.
Public/Granted literature
- US20090276078A1 Process control system, process control method, and method of manufacturing electronic apparatus Public/Granted day:2009-11-05
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