Invention Grant
- Patent Title: Field effect transistor and method for fabricating the same
- Patent Title (中): 场效应晶体管及其制造方法
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Application No.: US11297386Application Date: 2005-12-09
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Publication No.: US07834380B2Publication Date: 2010-11-16
- Inventor: Tetsuzo Ueda , Hidetoshi Ishida , Tsuyoshi Tanaka
- Applicant: Tetsuzo Ueda , Hidetoshi Ishida , Tsuyoshi Tanaka
- Applicant Address: JP Osaka
- Assignee: Panasonic Corporation
- Current Assignee: Panasonic Corporation
- Current Assignee Address: JP Osaka
- Agency: McDermott Will & Emery LLP
- Priority: JP2004-356369 20041209
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A field effect transistor includes a first semiconductor layer made of a multilayer of a plurality of semiconductor films and a second semiconductor layer formed on the first semiconductor layer. A source electrode and a drain electrode are formed on the second semiconductor layer to be spaced from each other. An opening having an insulating film on its inner wall is formed in a portion of the second semiconductor layer sandwiched between the source electrode and the drain electrode so as to expose the first semiconductor layer therein. A gate electrode is formed in the opening to be in contact with the insulating film and the first semiconductor layer on the bottom of the opening.
Public/Granted literature
- US20060124962A1 Field effect transistor and method for fabricating the same Public/Granted day:2006-06-15
Information query
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