Invention Grant
- Patent Title: Pixel with asymmetric transfer gate channel doping
- Patent Title (中): 具有不对称传输栅极通道掺杂的像素
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Application No.: US12481056Application Date: 2009-06-09
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Publication No.: US07834383B2Publication Date: 2010-11-16
- Inventor: Chintamani P. Palsule , Changhoon Choi , Fredrick P. LaMaster , John H. Stanback , Thomas E. Dungan , Thomas Joy , Homayoon Haddad
- Applicant: Chintamani P. Palsule , Changhoon Choi , Fredrick P. LaMaster , John H. Stanback , Thomas E. Dungan , Thomas Joy , Homayoon Haddad
- Applicant Address: KY Grand Cayman
- Assignee: Aptina Imaging Corporation
- Current Assignee: Aptina Imaging Corporation
- Current Assignee Address: KY Grand Cayman
- Agency: RatnerPrestia
- Main IPC: H01L31/062
- IPC: H01L31/062 ; H01L31/113

Abstract:
A pixel including a substrate of a first conductivity type and having a surface, a photodetector of a second conductivity type that is opposite the first conductivity type, a floating diffusion region of the second conductivity type, a transfer region between the photodetector and the floating diffusion, a gate positioned above the transfer region and partially overlapping the photodetector, and a pinning layer of the first conductivity type extending at least across the photodetector from the gate. A channel implant of the first conductivity type extending from between a midpoint of the transfer gate and the floating diffusion to at least across the photodiode and having a dopant concentration such that a dopant concentration of the transfer region is greater proximate to the photodetector than the floating diffusion, and wherein a peak dopant concentration of the channel implant is at a level and at a depth below the surface such that a partially-buried channel is formed in the transfer region between the photodiode and floating diffusion when the transfer gate is energized.
Public/Granted literature
- US20090250734A1 PIXEL WITH ASYMMETRIC TRANSFER GATE CHANNEL DOPING Public/Granted day:2009-10-08
Information query
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