Invention Grant
- Patent Title: Antifuse elements
- Patent Title (中): 防腐元素
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Application No.: US12413078Application Date: 2009-03-27
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Publication No.: US07834417B2Publication Date: 2010-11-16
- Inventor: Won Gi Min , Robert W. Baird , Gordon P. Lee , Jiang-Kai Zuo
- Applicant: Won Gi Min , Robert W. Baird , Gordon P. Lee , Jiang-Kai Zuo
- Applicant Address: US TX Austin
- Assignee: Freescale Semiconductor, Inc.
- Current Assignee: Freescale Semiconductor, Inc.
- Current Assignee Address: US TX Austin
- Agency: Ingrassia, Fisher & Lorenz, P.C.
- Main IPC: H01L23/52
- IPC: H01L23/52 ; H01L23/62

Abstract:
An antifuse element (102, 152, 252, 302, 352, 402, 602, 652, 702) includes a substrate material (101) having an active area (106) formed in an upper surface, a gate electrode (104) having at least a portion positioned above the active area (106), and a gate oxide layer (110) disposed between the gate electrode (104) and the active area (106). The gate oxide layer (110) includes one of a gate oxide dip (128) or a gate oxide undercut (614). During operation a voltage applied between the gate electrode (104) and the active area (106) creates a current path through the gate oxide layer (110) and a rupture of the gate oxide layer (110) in a rupture region (130). The rupture region (130) is defined by the oxide structure and the gate oxide dip (128) or the gate oxide undercut (614).
Public/Granted literature
- US20090224325A1 ANTIFUSE ELEMENTS Public/Granted day:2009-09-10
Information query
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