Invention Grant
- Patent Title: Semiconductor laser
- Patent Title (中): 半导体激光器
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Application No.: US12198152Application Date: 2008-08-26
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Publication No.: US07835413B2Publication Date: 2010-11-16
- Inventor: Tohru Takiguchi , Yuichiro Okunuki , Go Sakaino
- Applicant: Tohru Takiguchi , Yuichiro Okunuki , Go Sakaino
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2008-136513 20080526
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A semiconductor laser comprises: a ridge structure including a p-type cladding layer, an active layer, and an n-type cladding layer stacked on one another; and a burying layer burying sides of the ridge structure. The burying layer includes a p-type semiconductor layer and an n-type semiconductor layer that form a pn junction; and one of the p-type semiconductor layer and the n-type semiconductor layer has a carrier concentration of 5×1017 cm−3 or less near the pn junction.
Public/Granted literature
- US20090290611A1 SEMICONDUCTOR LASER AND MANUFACTURING METHOD THEREFOR Public/Granted day:2009-11-26
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