Invention Grant
- Patent Title: Drain-extended field effect transistor
- Patent Title (中): 漏极扩展场效应晶体管
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Application No.: US11950223Application Date: 2007-12-04
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Publication No.: US07838940B2Publication Date: 2010-11-23
- Inventor: Jens Schneider , Harald Gossner
- Applicant: Jens Schneider , Harald Gossner
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Agency: Slater & Matsil, L.L.P.
- Main IPC: H01L29/78
- IPC: H01L29/78

Abstract:
A drain-extended field effect transistor includes a drain contact region and a drain extension region. The drain-extended field effect transistor further includes an electrostatic discharge protection region that is electrically connected between the drain contact region and the drain extension region to protect the drain-extended field effect transistor against electrostatic discharge. The electrostatic discharge protection region has a dopant concentration level such that in case of an electrostatic discharge event, a base push-out is prevented from reaching the drain contact region.
Public/Granted literature
- US20090140335A1 Drain-Extended Field Effect Transistor Public/Granted day:2009-06-04
Information query
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