Invention Grant
- Patent Title: Shared gate for conventional planar device and horizontal CNT
- Patent Title (中): 常规平面器件和水平CNT的共用门
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Application No.: US11161146Application Date: 2005-07-25
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Publication No.: US07838943B2Publication Date: 2010-11-23
- Inventor: Toshiharu Furukawa , Mark C. Hakey , Steven J. Holmes , David V. Horak , Charles W. Koburger, III , Mark E. Masters
- Applicant: Toshiharu Furukawa , Mark C. Hakey , Steven J. Holmes , David V. Horak , Charles W. Koburger, III , Mark E. Masters
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Scully, Scott, Murphy & Presser, P.C.
- Agent Richard Kotulak, Esq.
- Main IPC: H01L21/70
- IPC: H01L21/70

Abstract:
A semiconductor structure in which a planar semiconductor device and a horizontal carbon nanotube transistor have a shared gate and a method of fabricating the same are provided in the present application. The hybrid semiconductor structure includes at least one horizontal carbon nanotube transistor and at least one planar semiconductor device, in which the at least one horizontal carbon nanotube transistor and the at least one planar semiconductor device have a shared gate and the at least one horizontal carbon nanotube transistor is located above a gate of the at least one planar semiconductor device.
Public/Granted literature
- US20070021293A1 SHARED GATE FOR CONVENTIONAL PLANAR DEVICE AND HORIZONTAL CNT Public/Granted day:2007-01-25
Information query
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