Invention Grant
- Patent Title: Assembly comprising a radiation source, a reflector and a contaminant barrier
- Patent Title (中): 组件包括辐射源，反射器和污染物屏障
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Application No.: US11802258Application Date: 2007-05-21
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Publication No.: US07839482B2Publication Date: 2010-11-23
- Inventor: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant: Wouter Anthon Soer , Maarten Marinus Johannes Wilhelmus Van Herpen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/54 ; G03B27/72
Abstract:
An assembly including a radiation reflector and a contaminant barrier is disclosed. The contaminant barrier is arranged to receive radiation from a radiation source and to reflect that radiation towards the radiation reflector, and the radiation reflector is arranged to reflect the radiation, received from the contaminant barrier, back towards the contaminant barrier.
Public/Granted literature
- US20080291406A1 Assembly comprising a radiation source, a reflector and a contaminant barrier Public/Granted day:2008-11-27
Information query
