Invention Grant
US07839979B2 Electron optical apparatus, X-ray emitting device and method of producing an electron beam
有权
电子光学装置,X射线发射装置和电子束的制造方法
- Patent Title: Electron optical apparatus, X-ray emitting device and method of producing an electron beam
- Patent Title (中): 电子光学装置,X射线发射装置和电子束的制造方法
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Application No.: US12444745Application Date: 2007-10-08
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Publication No.: US07839979B2Publication Date: 2010-11-23
- Inventor: Stefan Hauttmann , Wolfram Maring , Steffen Holzapfel
- Applicant: Stefan Hauttmann , Wolfram Maring , Steffen Holzapfel
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP06122223 20061013
- International Application: PCT/IB2007/054087 WO 20071008
- International Announcement: WO2008/044194 WO 20080417
- Main IPC: H01J35/30
- IPC: H01J35/30 ; H01J35/14

Abstract:
It is described an electron optical arrangement, a X-ray emitting device and a method of creating an electron beam. An electron optical apparatus (1) comprises the following components along an optical axis (25): a cathode with an emitter (3) having a substantially planar surface (9) for emitting electrons; an anode (11) for accelerating the emitted electrons in a direction essentially along the optical axis (25); a first magnetic quadrupole lens (19) for deflecting the accelerated electrons and having a first yoke (41); a second magnetic quadrupole lens (21) for further deflecting the accelerated electrons and having a second yoke (51); and a magnetic dipole lens (23) for further deflecting the accelerated electrons.
Public/Granted literature
- US20100020937A1 ELECTRON OPTICAL APPARATUS, X-RAY EMITTING DEVICE AND METHOD OF PRODUCING AN ELECTRON BEAM Public/Granted day:2010-01-28
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