Invention Grant
- Patent Title: Imaging device by buried photodiode structure
- Patent Title (中): 成像装置采用掩埋光电二极管结构
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Application No.: US11577546Application Date: 2005-10-18
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Publication No.: US07842978B2Publication Date: 2010-11-30
- Inventor: Shoji Kawahito
- Applicant: Shoji Kawahito
- Applicant Address: JP Shizuoka-shi
- Assignee: National University Corporation Shizuoka University
- Current Assignee: National University Corporation Shizuoka University
- Current Assignee Address: JP Shizuoka-shi
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2004-303983 20041019
- International Application: PCT/JP2005/019464 WO 20051018
- International Announcement: WO2006/043697 WO 20060427
- Main IPC: H01L31/113
- IPC: H01L31/113

Abstract:
An n-type region as a charge storage region of a photodiode is buried in a substrate. The interface between silicon and a silicon oxide film is covered with a high concentration p-layer and a lower concentration p-layer is formed only in the portion immediately below a floating electrode for signal extraction. Electrons generated by light are stored in the charge storage region, thereby changing the potential of the portion of the p-layer at the surface of the semiconductor region. The change is transmitted through a thin insulating film to the floating electrode by capacitive coupling and read out by a buffer transistor. Initialization of charges is executed by adding a positive high voltage to the gate electrode of a first transfer transistor such that the electrons stored in the charge storage region are transferred to the n+ region and generation of reset noise is protected.
Public/Granted literature
- US20080277700A1 Imaging Device by Buried Photodiode Structure Public/Granted day:2008-11-13
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