Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11984934Application Date: 2007-11-26
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Publication No.: US07843551B2Publication Date: 2010-11-30
- Inventor: Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- Applicant: Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
Public/Granted literature
- US20080074630A1 Lithographic apparatus and device manufacturing method Public/Granted day:2008-03-27
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