Invention Grant
US07843552B2 Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto
失效
平版印刷装置，装置制造方法以及附着有防护薄膜的掩模
- Patent Title: Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto
- Patent Title (中): 平版印刷装置，装置制造方法以及附着有防护薄膜的掩模
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Application No.: US11154951Application Date: 2005-06-17
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Publication No.: US07843552B2Publication Date: 2010-11-30
- Inventor: Richard Joseph Bruls , Orlando Serapio Cicilia , Tammo Uitterdijk , Herman Boom
- Applicant: Richard Joseph Bruls , Orlando Serapio Cicilia , Tammo Uitterdijk , Herman Boom
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/62
- IPC: G03B27/62 ; G03B27/58
Abstract:
The mechanical properties of a pellicle frame and/or the pellicle are optimized so that the mechanical effect of the frame and pellicle on the mask shape in use is optimum for imaging. In particular the pellicle frame assembly may be arranged to be mechanically neutral, i.e., the mask adopts the same shape with pellicle attached as it would without the pellicle.
Public/Granted literature
- US20050280789A1 Lithographic apparatus, device manufacturing method, and mask having a pellicle attached hereto Public/Granted day:2005-12-22
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