Invention Grant
- Patent Title: Method of positioning patterns from block copolymer self-assembly
- Patent Title (中): 从嵌段共聚物自组装定位图案的方法
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Application No.: US12482583Application Date: 2009-06-11
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Publication No.: US07846502B2Publication Date: 2010-12-07
- Inventor: Ho-Cheol Kim , Charles T Rettner , Sang-Min Park
- Applicant: Ho-Cheol Kim , Charles T Rettner , Sang-Min Park
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agent Leander F. Aulisio
- Main IPC: B05D3/00
- IPC: B05D3/00

Abstract:
A method of controlling both alignment and registration (lateral position) of lamellae formed from self-assembly of block copolymers, the method comprising the steps of obtaining a substrate having an energetically neutral surface layer comprising a first topographic “phase pinning” pattern and a second topographic “guiding” pattern; obtaining a self-assembling di-block copolymer; coating the self-assembling di-block copolymer on the energetically neutral surface to obtain a coated substrate; and annealing the coated substrate to obtain micro-domains of the di-block copolymer.
Public/Granted literature
- US20100120252A1 Method of Positioning Patterns from Block Copolymer Self-Assembly Public/Granted day:2010-05-13
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