Invention Grant
- Patent Title: Method for producing patterns in a polymer layer
- Patent Title (中): 在聚合物层中生产图案的方法
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Application No.: US12149367Application Date: 2008-04-30
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Publication No.: US07846512B2Publication Date: 2010-12-07
- Inventor: Frédéric-Xavier Gaillard , Laurent Vandroux
- Applicant: Frédéric-Xavier Gaillard , Laurent Vandroux
- Applicant Address: FR Paris
- Assignee: Commissariat a l'Energie Atomique
- Current Assignee: Commissariat a l'Energie Atomique
- Current Assignee Address: FR Paris
- Agency: Oliff & Berridge, PLC
- Priority: FR0703230 20070504
- Main IPC: H05H1/24
- IPC: H05H1/24
Abstract:
A method for producing patterns in a polymer layer. Polymer sites are formed on a support. These sites are subjected to a plasma deposition of dielectric material and preferably react with this plasma so as to form openings at the level of said sites. A pattern structure is then formed in the dielectric material and/or in the polymer.
Public/Granted literature
- US20080274301A1 Method for producing patterns in a polymer layer Public/Granted day:2008-11-06
Information query
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