Invention Grant
US07847247B2 Method of plasma particle simulation, storage medium, plasma particle simulator and plasma processing apparatus
有权
等离子体粒子模拟方法,存储介质,等离子体粒子模拟器和等离子体处理装置
- Patent Title: Method of plasma particle simulation, storage medium, plasma particle simulator and plasma processing apparatus
- Patent Title (中): 等离子体粒子模拟方法,存储介质,等离子体粒子模拟器和等离子体处理装置
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Application No.: US12198420Application Date: 2008-08-26
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Publication No.: US07847247B2Publication Date: 2010-12-07
- Inventor: Kazuki Denpoh
- Applicant: Kazuki Denpoh
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-220099 20070827
- Main IPC: G21G4/00
- IPC: G21G4/00

Abstract:
A method of plasma particle simulation capable of preventing solution divergence. A space within a housing chamber of a plasma processing apparatus is divided into a plurality of cells. A weighting factor corresponding to the number of plasma particles represented by a superparticle is set in each of the divided cells. Superparticles are set in each of the divided cells using plasma particles contained in the divided cell and the set weighting factor. The behavior of the superparticles in each of the divided cells is calculated. The weighting factor becomes smaller as the divided cell is located closer to a solid wall surface of the housing chamber.
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