Invention Grant
US07847266B2 Device and method for selecting an emission area of an emission pattern
有权
用于选择发射模式的发射区域的装置和方法
- Patent Title: Device and method for selecting an emission area of an emission pattern
- Patent Title (中): 用于选择发射模式的发射区域的装置和方法
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Application No.: US11469753Application Date: 2006-09-01
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Publication No.: US07847266B2Publication Date: 2010-12-07
- Inventor: Fang Zhou , Jürgen Frosien
- Applicant: Fang Zhou , Jürgen Frosien
- Applicant Address: DE Heimstetten
- Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Current Assignee: ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH
- Current Assignee Address: DE Heimstetten
- Agency: Patterson & Sheridan, LLP
- Priority: EP05019361 20050906
- Main IPC: H01J3/14
- IPC: H01J3/14
Abstract:
A charged particle beam apparatus and a method for measuring an emission pattern of such an apparatus are provided. The apparatus comprises an emitter with an emission pattern including at least two emission peaks, a gun lens, and a diaphragm, wherein the gun lens comprises a deflector unit and the deflector unit is adapted to direct an emission peak of the at least two emission peaks to an opening of the diaphragm to thereby select the emission peak of the at least two emission peaks from the emission pattern.
Public/Granted literature
- US20070085018A1 DEVICE AND METHOD FOR SELECTING AN EMISSION AREA OF AN EMISSION PATTERN Public/Granted day:2007-04-19
Information query
