Invention Grant
- Patent Title: Nitride semiconductor LED and fabrication method thereof
- Patent Title (中): 氮化物半导体LED及其制造方法
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Application No.: US11718664Application Date: 2005-07-06
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Publication No.: US07847279B2Publication Date: 2010-12-07
- Inventor: Suk Hun Lee
- Applicant: Suk Hun Lee
- Applicant Address: KR Seoul
- Assignee: LG Innotek Co., Ltd.
- Current Assignee: LG Innotek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Saliwanchik
- International Application: PCT/KR2005/002173 WO 20050706
- International Announcement: WO2007/102627 WO 20070913
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A nitride semiconductor light emitting diode according to the present invention, includes: a substrate; a buffer layer formed on the substrate; an In-doped GaN layer formed on the buffer layer; a first electrode layer formed on the In-doped GaN layer; an InxGa1-xN layer formed on the first electrode layer; an active layer formed on the InxGa1-xN layer; a first P—GaN layer formed on the active layer; a second electrode layer formed on the first P—GaN layer; a second P—GaN layer partially protruded on the second electrode layer; and a third electrode formed on the second P—GaN layer.
Public/Granted literature
- US20090072220A1 Nitride Semiconductor LED and Fabrication Method Thereof Public/Granted day:2009-03-19
Information query
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