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US07847279B2 Nitride semiconductor LED and fabrication method thereof 有权
氮化物半导体LED及其制造方法

  • Patent Title: Nitride semiconductor LED and fabrication method thereof
  • Patent Title (中): 氮化物半导体LED及其制造方法
  • Application No.: US11718664
    Application Date: 2005-07-06
  • Publication No.: US07847279B2
    Publication Date: 2010-12-07
  • Inventor: Suk Hun Lee
  • Applicant: Suk Hun Lee
  • Applicant Address: KR Seoul
  • Assignee: LG Innotek Co., Ltd.
  • Current Assignee: LG Innotek Co., Ltd.
  • Current Assignee Address: KR Seoul
  • Agency: Saliwanchik, Lloyd & Saliwanchik
  • International Application: PCT/KR2005/002173 WO 20050706
  • International Announcement: WO2007/102627 WO 20070913
  • Main IPC: H01L33/00
  • IPC: H01L33/00
Nitride semiconductor LED and fabrication method thereof
Abstract:
A nitride semiconductor light emitting diode according to the present invention, includes: a substrate; a buffer layer formed on the substrate; an In-doped GaN layer formed on the buffer layer; a first electrode layer formed on the In-doped GaN layer; an InxGa1-xN layer formed on the first electrode layer; an active layer formed on the InxGa1-xN layer; a first P—GaN layer formed on the active layer; a second electrode layer formed on the first P—GaN layer; a second P—GaN layer partially protruded on the second electrode layer; and a third electrode formed on the second P—GaN layer.
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