Invention Grant
US07847310B2 Migration enhanced epitaxy fabrication of active regions having quantum wells
有权
迁移增强了具有量子阱的有源区的外延生长
- Patent Title: Migration enhanced epitaxy fabrication of active regions having quantum wells
- Patent Title (中): 迁移增强了具有量子阱的有源区的外延生长
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Application No.: US12250405Application Date: 2008-10-13
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Publication No.: US07847310B2Publication Date: 2010-12-07
- Inventor: Ralph H. Johnson
- Applicant: Ralph H. Johnson
- Applicant Address: US CA Sunnyvale
- Assignee: Finisar Corporation
- Current Assignee: Finisar Corporation
- Current Assignee Address: US CA Sunnyvale
- Agency: Workman Nydegger
- Main IPC: H01L31/00
- IPC: H01L31/00

Abstract:
Semiconductor lasers, such as VCSELs having active regions with flattening layers associated with nitrogen-containing quantum wells are disclosed. MEE (Migration Enhanced Epitaxy) is used to form a flattening layer upon which a quantum well is formed and thereby enhance smoothness of quantum well interfaces and to achieve narrowing of the spectrum of light emitted from nitrogen containing quantum wells. A cap layer is also formed over the quantum well.
Public/Granted literature
- US20090034571A1 MIGRATION ENHANCED EPITAXY FABRICATION OF ACTIVE REGIONS HAVING QUANTUM WELLS Public/Granted day:2009-02-05
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