Invention Grant
- Patent Title: Method and apparatus for gas concentration quantitative analysis
- Patent Title (中): 气体浓度定量分析方法与装置
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Application No.: US12050244Application Date: 2008-03-18
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Publication No.: US07847935B2Publication Date: 2010-12-07
- Inventor: Satoshi Nitta , Yoshihiro Osawa
- Applicant: Satoshi Nitta , Yoshihiro Osawa
- Applicant Address: JP Osaka
- Assignee: Otsuka Electronics Co., Ltd.
- Current Assignee: Otsuka Electronics Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2007-072738 20070320
- Main IPC: G01J3/42
- IPC: G01J3/42

Abstract:
An FTIR measurement is conducted on a background gas to obtain a single beam spectrum SB(BG) [C] and a synthetic single beam spectrum SSB(BG)[D], and an FTIR measurement is conducted on a sample gas to obtain a single beam spectrum SB(Samp)[E] and a synthetic single beam spectrum SSB(Samp)[F]. A double synthetic absorbance spectrum DSAbs of the sample gas as expressed by the following formula (Step T9) is calculated to obtain a concentration of a trace component (impurity) contained in the sample gas: DSAbs =−log[SB(Samp) SSB(BG)/SSB(Samp) SB(BG)]
Public/Granted literature
- US20080231841A1 METHOD AND APPARATUS FOR GAS CONCENTRATION QUANTITATIVE ANALYSIS Public/Granted day:2008-09-25
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