Invention Grant
US07848031B2 Hologram and method of manufacturing an optical element using a hologram
有权
全息图和使用全息图制造光学元件的方法
- Patent Title: Hologram and method of manufacturing an optical element using a hologram
- Patent Title (中): 全息图和使用全息图制造光学元件的方法
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Application No.: US11795598Application Date: 2006-01-20
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Publication No.: US07848031B2Publication Date: 2010-12-07
- Inventor: Jochen Hetzler , Susanne Beder , Heiko Feldmann
- Applicant: Jochen Hetzler , Susanne Beder , Heiko Feldmann
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT AG
- Current Assignee: Carl Zeiss SMT AG
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- International Application: PCT/EP2006/000518 WO 20060120
- International Announcement: WO2006/077145 WO 20060727
- Main IPC: G02B3/02
- IPC: G02B3/02

Abstract:
A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.
Public/Granted literature
- US20080137090A1 Hologram and Method of Manufacturing an Optical Element Using a Hologram Public/Granted day:2008-06-12
Information query
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B3/00 | 简单或复合透镜 |
G02B3/02 | .具有非球面的(G02B3/10优先) |