Invention Grant
US07851882B2 Silicon carbide semiconductor device having junction barrier schottky diode
有权
具有结屏障肖特基二极管的碳化硅半导体器件
- Patent Title: Silicon carbide semiconductor device having junction barrier schottky diode
- Patent Title (中): 具有结屏障肖特基二极管的碳化硅半导体器件
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Application No.: US12216182Application Date: 2008-07-01
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Publication No.: US07851882B2Publication Date: 2010-12-14
- Inventor: Eiichi Okuno , Takeo Yamamoto
- Applicant: Eiichi Okuno , Takeo Yamamoto
- Applicant Address: JP Kariya
- Assignee: DENSO CORPORATION
- Current Assignee: DENSO CORPORATION
- Current Assignee Address: JP Kariya
- Agency: Posz Law Group, PLC
- Priority: JP2007-177284 20070705
- Main IPC: H01L29/47
- IPC: H01L29/47

Abstract:
A silicon carbide semiconductor device includes a drift layer having first conductive type on a substrate, a cell region in the drift layer, a schottky electrode on the drift layer and multiple second conductive type layers in the cell region. The second conductive type layers are separated from each other and contact the schottky electrode. A size and an impurity concentration of the second conductive type layers and a size and an impurity concentration of a portion of the drift layer sandwiched between the second conductive type layers are determined so that a charge quantity of the second conductive type layers is equal to a charge quantity of the portion. Hereby, the pressure-proof JBS and low resistivity second conductive type layers arranged on a surface of the drift layer to provide a PN diode, can be obtained.
Public/Granted literature
- US20090008651A1 Silicon carbide semiconductor device having junction barrier schottky diode Public/Granted day:2009-01-08
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