Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12213589Application Date: 2008-06-20
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Publication No.: US07852457B2Publication Date: 2010-12-14
- Inventor: Stefan Philip Christiaan Belfroid , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Johannes Petrus Maria Smeulers , Arno Willem Frederik Volker , Rene Breeuwer
- Applicant: Stefan Philip Christiaan Belfroid , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Johannes Petrus Maria Smeulers , Arno Willem Frederik Volker , Rene Breeuwer
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42 ; G03B27/32 ; G03C5/00
Abstract:
In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
Public/Granted literature
- US20090009734A1 Lithographic apparatus and device manufacturing method Public/Granted day:2009-01-08
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