Invention Grant
- Patent Title: Nonvolatile memory using resistance material
- Patent Title (中): 使用电阻材料的非易失性存储器
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Application No.: US12243578Application Date: 2008-10-01
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Publication No.: US07852666B2Publication Date: 2010-12-14
- Inventor: Joon-Yong Choi , Byung-Gil Choi
- Applicant: Joon-Yong Choi , Byung-Gil Choi
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co. Ltd.
- Current Assignee: Samsung Electronics Co. Ltd.
- Current Assignee Address: KR Suwon-Si
- Agency: F. Chau & Associates, LLC
- Priority: KR10-2007-0102658 20071011
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C8/00

Abstract:
A nonvolatile memory using a resistance material includes first and second memory-cell blocks having different block address information and each including a plurality of nonvolatile memory cells; a global bitline common to the first and second memory-cell blocks; first and second local bitlines corresponding to the first and second memory-cell blocks, respectively, and coupled to each other; and a common bitline selection circuit interposed between the first and second memory-cell blocks and coupled between the first and second local bitlines and the global bitline.
Public/Granted literature
- US20090122600A1 NONVOLATILE MEMORY USING RESISTANCE MATERIAL Public/Granted day:2009-05-14
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