Invention Grant
- Patent Title: Method for polishing
- Patent Title (中): 抛光方法
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Application No.: US11729799Application Date: 2007-03-30
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Publication No.: US07854645B2Publication Date: 2010-12-21
- Inventor: Sven Kiontke , Thomas Kurschel
- Applicant: Sven Kiontke , Thomas Kurschel
- Applicant Address: DE Jena
- Assignee: asphericon GmbH
- Current Assignee: asphericon GmbH
- Current Assignee Address: DE Jena
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: DE102004047563 20040930
- Main IPC: B24B51/00
- IPC: B24B51/00

Abstract:
A method is disclosed, whereby a reduced wear of the polishing tool and a reduced duration for the polishing process may be achieved and also free form surfaces and non-rotating workpieces may be polished. The above may be achieved whereby the surface of the tool actually in contact with the workpiece lies off the tool axis. The invention further relates to a method for polishing a surface of a workpiece, via a tool rotating about a tool axis, whereby the workpiece, at least in one region of the workpiece surface has a contacted surface which is part region of a surface for machining, which for its part is at least part of a polishing surface of the tool, whereby the tool axis intersects the polishing surface.
Public/Granted literature
- US20070173176A1 Method for polishing Public/Granted day:2007-07-26
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