Invention Grant
US07854867B2 Method for detecting a particle in a nanoimprint lithography system
有权
在纳米压印光刻系统中检测颗粒的方法
- Patent Title: Method for detecting a particle in a nanoimprint lithography system
- Patent Title (中): 在纳米压印光刻系统中检测颗粒的方法
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Application No.: US11737301Application Date: 2007-04-19
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Publication No.: US07854867B2Publication Date: 2010-12-21
- Inventor: Philip D. Schumaker
- Applicant: Philip D. Schumaker
- Applicant Address: US TX Austin
- Assignee: Molecular Imprints, Inc.
- Current Assignee: Molecular Imprints, Inc.
- Current Assignee Address: US TX Austin
- Agent Laura C. Robinson
- Main IPC: B29C59/02
- IPC: B29C59/02
Abstract:
A method for detecting a particle between a nanoimprint mold assembly and a substrate in a nanoimprint lithography system.
Public/Granted literature
- US20070246850A1 Method for Detecting a Particle in a Nanoimprint Lithography System Public/Granted day:2007-10-25
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