Invention Grant
- Patent Title: Bipolar complementary semiconductor device
- Patent Title (中): 双极互补半导体器件
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Application No.: US10581127Application Date: 2004-12-01
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Publication No.: US07855404B2Publication Date: 2010-12-21
- Inventor: Bernd Heinenman , Jürgen Drews , Steffen Marschmayer , Holger Rücker
- Applicant: Bernd Heinenman , Jürgen Drews , Steffen Marschmayer , Holger Rücker
- Applicant Address: DE Frankfurt
- Assignee: IHP GmbH—Innovations for High Performance Microelectronics/Leibniz-Instituit fur Innovative Mikroelektronik
- Current Assignee: IHP GmbH—Innovations for High Performance Microelectronics/Leibniz-Instituit fur Innovative Mikroelektronik
- Current Assignee Address: DE Frankfurt
- Agency: Ware, Fressola, Van Der Sluys & Adolphson LLP
- Priority: DE10358047 20031205
- International Application: PCT/EP2004/013855 WO 20041201
- International Announcement: WO2005/055289 WO 20050616
- Main IPC: H01L29/80
- IPC: H01L29/80 ; H01L31/112

Abstract:
A complementary BiCMOS semiconductor device comprises a substrate of a first conductivity type and a number of active regions which are provided therein and which are delimited in the lateral direction by shallow field insulation regions, in which vertical npn-bipolar transistors with an epitaxial base are arranged in a first subnumber of the active regions and vertical pnp-bipolar transistors with an epitaxial base are arranged in a second subnumber of the active regions, wherein either one transistor type or both transistor types have both a collector region and also a collector contact region in one and the same respective active region. To improve the high-frequency properties exclusively in a first transistor type in which the conductivity type of the substrate is identical to that of the collector region, an insulation doping region is provided between the collector region and the substrate.
Public/Granted literature
- US20090206335A1 Bipolar complementary semiconductor device Public/Granted day:2009-08-20
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