Invention Grant
US07855455B2 Lock and key through-via method for wafer level 3 D integration and structures produced 有权
用于晶圆级3D集成和结构的锁定和键通孔方法

Lock and key through-via method for wafer level 3 D integration and structures produced
Abstract:
A three dimensional device stack structure comprises two or more active device and interconnect layers further connected together using through substrate vias. Methods of forming the three dimensional device stack structure comprise alignment, bonding by lamination, thinning and post thinning processing. The via features enable the retention of alignment through the lamination process and any subsequent process steps thus achieving a mechanically more robust stack structure compared to the prior art.
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