Invention Grant
- Patent Title: X-ray diffraction measuring apparatus having debye-scherrer optical system therein, and an X-ray diffraction measuring method for the same
- Patent Title (中): 其中具有德拜勒光学系统的X射线衍射测量装置及其X射线衍射测量方法
-
Application No.: US12238471Application Date: 2008-09-26
-
Publication No.: US07860217B2Publication Date: 2010-12-28
- Inventor: Tetsuya Ozawa , Ryuji Matsuo , Go Fujinawa , Akira Echizenya
- Applicant: Tetsuya Ozawa , Ryuji Matsuo , Go Fujinawa , Akira Echizenya
- Applicant Address: JP Tokyo
- Assignee: Rigaku Corporation
- Current Assignee: Rigaku Corporation
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-253146 20070928
- Main IPC: G01N23/207
- IPC: G01N23/207

Abstract:
An X-ray diffraction measuring apparatus equipped with Debye-Scherrer optical system therein, comprises a generator for generating a characteristic X-ray to be irradiated upon a sample to be measured; an X-ray detector being disposed to surround that sample around; and a focusing arrangement, being disposed between the sample and the X-ray detector, for collecting an X-ray scattering from the sample covering over a predetermined angle, in a peripheral direction, around the sample, and for focusing and irradiating it upon the X-ray detector.
Public/Granted literature
Information query