Invention Grant
US07860675B2 Pattern inspection apparatus, pattern inspection method, and pattern inspection program 有权
图案检查装置,图案检验方法和图案检验程序

  • Patent Title: Pattern inspection apparatus, pattern inspection method, and pattern inspection program
  • Patent Title (中): 图案检查装置,图案检验方法和图案检验程序
  • Application No.: US11718548
    Application Date: 2005-11-04
  • Publication No.: US07860675B2
    Publication Date: 2010-12-28
  • Inventor: Hiroyoshi Miyano
  • Applicant: Hiroyoshi Miyano
  • Applicant Address: JP Tokyo
  • Assignee: NEC Corporation
  • Current Assignee: NEC Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Dickstein Shapiro LLP
  • Priority: JP2004-322200 20041105
  • International Application: PCT/JP2005/020282 WO 20051104
  • International Announcement: WO2006/049243 WO 20060511
  • Main IPC: G01R13/00
  • IPC: G01R13/00
Pattern inspection apparatus, pattern inspection method, and pattern inspection program
Abstract:
The present invention has an object of realizing a defect inspection estimated at high accuracy by preparing a reference image that reflects the change of the blur with time from a sampled image and design data. The present invention comprises a point spread function estimating section 23 for estimating a point spread function from an observation image and design information, a convolution image generating section 31 for generating a convolution image by convoluting the point spread function relative to the design information and a reference image generating section 33 for generating a reference image from the convolution image obtained by the convolution image generating section. binary image relative to “chromium on quartz glass”.
Information query
Patent Agency Ranking
0/0