Invention Grant
- Patent Title: Process for design of semiconductor circuits
- Patent Title (中): 半导体电路设计工艺
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Application No.: US12022860Application Date: 2008-01-30
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Publication No.: US07861195B2Publication Date: 2010-12-28
- Inventor: Darin A. Chan , Yi Zou , Yuansheng Ma , Marilyn Wright , Mark Michael
- Applicant: Darin A. Chan , Yi Zou , Yuansheng Ma , Marilyn Wright , Mark Michael , Donna Michael, legal representative
- Applicant Address: US CA Sunnyvale
- Assignee: Advanced Mirco Devices, Inc.
- Current Assignee: Advanced Mirco Devices, Inc.
- Current Assignee Address: US CA Sunnyvale
- Agency: Ditthavong Mori & Steiner, P.C.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
The present invention generates model scenarios of semiconductor chip design and uses interpolation and Monte Carlo, with random number generation inputs, techniques to iteratively assess the models for a more comprehensive and accurate assessment of design space, and evaluation under projected manufacturing conditions. This evaluation information is then incorporated into design rules in order to improve yield.
Public/Granted literature
- US20090193369A1 PROCESS FOR DESIGN OF SEMICONDUCTOR CIRCUITS Public/Granted day:2009-07-30
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