Invention Grant
- Patent Title: Cleaning/drying apparatus and cleaning/drying method
- Patent Title (中): 清洁/干燥设备和清洁/干燥方法
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Application No.: US12186221Application Date: 2008-08-05
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Publication No.: US07861731B2Publication Date: 2011-01-04
- Inventor: Michinao Nomura , Mitsuru Kubo , Chujiro Fukasawa
- Applicant: Michinao Nomura , Mitsuru Kubo , Chujiro Fukasawa
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2007-258077 20071001
- Main IPC: B08B3/02
- IPC: B08B3/02 ; F26B21/10 ; F26B21/12

Abstract:
A cleaning/drying apparatus including a vapor area where vapor of an organic solvent inside the cleaning/drying apparatus is generated, an ejecting part configured to eject the organic solvent onto a cleaning/drying target, a first detecting part configured to determine whether the temperature of the cleaning/drying target is a first temperature equivalent to a temperature of the vapor in the vapor area, a second detecting part configured to determine whether the temperature of the cleaning/drying target is a second temperature enabling the organic solvent to condense on a surface of the cleaning/drying target, and a cleaning/drying control part configured to drive the ejecting part to eject the organic solvent when the first detecting part detects that the temperature of the cleaning/drying target is the first temperature and stop the ejection when the second detecting part detects that the temperature of the cleaning/drying target is the second temperature.
Public/Granted literature
- US20090084415A1 CLEANING/DRYING APPARATUS AND CLEANING/DRYING METHOD Public/Granted day:2009-04-02
Information query
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