Invention Grant
- Patent Title: Methods for processing a substrate with a flow controlled meniscus
- Patent Title (中): 用流动控制的弯液面处理衬底的方法
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Application No.: US12381643Application Date: 2009-03-13
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Publication No.: US07862663B2Publication Date: 2011-01-04
- Inventor: James P. Garcia
- Applicant: James P. Garcia
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla & Gencarella, LLP
- Main IPC: B08B3/00
- IPC: B08B3/00
Abstract:
A method for processing a substrate is provided which includes applying fluid onto a surface of the substrate from a portion of a plurality of inlets and removing at least the fluid from the surface of the substrate where the removing being processed as the fluid is applied to the surface. The applying the fluid and the removing the fluid forms a segment of a fluid meniscus on the surface of the substrate.
Public/Granted literature
- US20090176360A1 Methods for processing a substrate with a flow controlled meniscus Public/Granted day:2009-07-09
Information query
