Invention Grant
US07862732B2 Method for forming micro lenses and semiconductor device including the micro lenses
有权
用于形成微透镜的方法和包括微透镜的半导体器件
- Patent Title: Method for forming micro lenses and semiconductor device including the micro lenses
- Patent Title (中): 用于形成微透镜的方法和包括微透镜的半导体器件
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Application No.: US11761880Application Date: 2007-06-12
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Publication No.: US07862732B2Publication Date: 2011-01-04
- Inventor: Hiroki Amemiya
- Applicant: Hiroki Amemiya
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-178502 20060628
- Main IPC: B81C1/00
- IPC: B81C1/00

Abstract:
In a method for forming micro lenses, a lens material layer made of an inorganic material is formed on a substrate, and an intermediate layer made of an organic material is formed on the lens material layer. Then, a mask layer made of an organic material is formed on the intermediate layer, and lens shapes are formed in the mask layer. The lens shapes of the mask layer are transcribed to the intermediate layer by etching the mask layer and the intermediate layer. Thereafter, the lens shapes of the intermediate layer are transcribed to the lens material layer to form micro lenses by etching the intermediate layer and the lens material layer using a processing gas containing SF6 gas and CHF3 gas.
Public/Granted literature
- US20080000872A1 METHOD FOR FORMING MICRO LENSES AND SEMICONDUCTOR DEVICE INCLUDING THE MICRO LENSES Public/Granted day:2008-01-03
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