Invention Grant
- Patent Title: Method for manufacturing a probe
- Patent Title (中): 探针制造方法
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Application No.: US11960502Application Date: 2007-12-19
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Publication No.: US07862733B2Publication Date: 2011-01-04
- Inventor: Takayuki Hayashizaki , Hideki Hirakawa , Akira Soma , Kazuhito Hamada
- Applicant: Takayuki Hayashizaki , Hideki Hirakawa , Akira Soma , Kazuhito Hamada
- Applicant Address: JP Musashino-shi, Tokyo
- Assignee: Kabushiki Kaisha Nihon Micronics
- Current Assignee: Kabushiki Kaisha Nihon Micronics
- Current Assignee Address: JP Musashino-shi, Tokyo
- Agency: Ingrassia Fisher & Lorenz, P.C.
- Priority: JP2007-000651 20070105
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
The present invention provides a probe manufacturing method in which, after a metal material for a probe is deposited on a base table, the probe can be detached from the base table relatively easily. A sacrificial layer is formed on a base table. The sacrificial layer is partially removed so as to form a recess in the sacrificial layer. A mask that exposes an area formed in a desired probe flat surface shape containing the recess is formed on the sacrificial layer. A probe material exhibiting different etching resistance characteristics from those of the sacrificial layer is deposited in the area exposed from the mask. By the deposition of the material, a coupling portion corresponding to the recess and a probe that is integral with the coupling portion are formed. After the mask is removed, the sacrificial layer is removed with use of etchant. Thereafter, the probe held on the base table at the coupling portion is detached from the base table together with the coupling portion.
Public/Granted literature
- US20080210663A1 METHOD FOR MANUFACTURING A PROBE Public/Granted day:2008-09-04
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