Invention Grant
- Patent Title: Imprint lithography
- Patent Title (中): 印刷光刻
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Application No.: US11392950Application Date: 2006-03-30
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Publication No.: US07862756B2Publication Date: 2011-01-04
- Inventor: Sander Frederik Wuister , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
- Applicant: Sander Frederik Wuister , Johan Frederik Dijksman , Yvonne Wendela Kruijt-Stegeman , Ivar Schram
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherland B.V.
- Current Assignee: ASML Netherland B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: B29C43/00
- IPC: B29C43/00

Abstract:
A method of making a substantial replica of a first imprint template which bears a first pattern is disclosed. The method includes filling recesses of the first pattern with a first material, removing the first material from the first imprint template to form a second imprint template which bears a second pattern, the second pattern being the substantial inverse of the first pattern, filling recesses of the second pattern with a photo-curable medium, curing the photo-curable medium by illuminating it with radiation, and removing the cured medium from the second imprint template to form a third imprint template which bears a pattern that is a substantial replica of the first pattern.
Public/Granted literature
- US20070238037A1 Imprint lithography Public/Granted day:2007-10-11
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