Invention Grant
- Patent Title: Method for forming an electrical structure comprising multiple photosensitive materials
- Patent Title (中): 用于形成包括多个感光材料的电结构的方法
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Application No.: US11942753Application Date: 2007-11-20
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Publication No.: US07862987B2Publication Date: 2011-01-04
- Inventor: Timothy Harrison Daubenspeck , Jeffrey Peter Gambino , Christopher David Muzzy , Wolfgang Sauter
- Applicant: Timothy Harrison Daubenspeck , Jeffrey Peter Gambino , Christopher David Muzzy , Wolfgang Sauter
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Agent Richard M. Kotulak
- Main IPC: G03F7/26
- IPC: G03F7/26

Abstract:
An electrical structure and method of forming. The method comprises providing a substrate structure. A first layer comprising a first photosensitive material having a first polarity is formed over and in contact with the substrate structure. A second layer comprising photosensitive material having a second polarity is formed over and in contact with the first layer. The first polarity comprises an opposite polarity as the second polarity. Portions of the first and second layers are simultaneously exposed to a photo exposure light source. The portions of the first and second layers are developed such that structures are formed.
Public/Granted literature
- US20090130599A1 METHOD FOR FORMING AN ELECTRICAL STRUCTURE COMPRISING MULTIPLE PHOTOSENSITIVE MATERIALS Public/Granted day:2009-05-21
Information query
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