Invention Grant
US07862990B2 Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
有权
具有抗反射性能和高碳含量的聚合物，包含其的硬掩模组合物，以及用于形成图案化材料层的方法
- Patent Title: Polymer having antireflective properties and high carbon content, hardmask composition including the same, and process for forming a patterned material layer
- Patent Title (中): 具有抗反射性能和高碳含量的聚合物，包含其的硬掩模组合物，以及用于形成图案化材料层的方法
-
Application No.: US12003732Application Date: 2007-12-31
-
Publication No.: US07862990B2Publication Date: 2011-01-04
- Inventor: Kyong Ho Yoon , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyung Hee Hyung , Min Soo Kim , Jin Kuk Lee
- Applicant: Kyong Ho Yoon , Jong Seob Kim , Dong Seon Uh , Chang Il Oh , Kyung Hee Hyung , Min Soo Kim , Jin Kuk Lee
- Applicant Address: KR Gumi-si, Kyeongsangbuk-do
- Assignee: Cheil Industries, Inc.
- Current Assignee: Cheil Industries, Inc.
- Current Assignee Address: KR Gumi-si, Kyeongsangbuk-do
- Agency: Lee & Morse, P.C.
- Priority: KR10-2006-0139169 20061230
- Main IPC: G03F7/11
- IPC: G03F7/11 ; G03F7/40
Abstract:
An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
Public/Granted literature
Information query
IPC分类:
