Invention Grant
- Patent Title: Image sensor and method for manufacturing the same
- Patent Title (中): 图像传感器及其制造方法
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Application No.: US12179607Application Date: 2008-07-25
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Publication No.: US07863073B2Publication Date: 2011-01-04
- Inventor: Kyung Min Park
- Applicant: Kyung Min Park
- Applicant Address: KR Seoul
- Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee: Dongbu Hitek Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Saliwanchik, Lloyd & Saliwanchik
- Priority: KR10-2007-0077672 20070802
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
An image sensor and a method for manufacturing the same are provided. The image sensor comprises at least one unit pixel, an interlayer dielectric, a color filter, a planarization layer, and a microlens. The microlens has a smooth surface after performing a plasma treatment process.
Public/Granted literature
- US20090032895A1 Image Sensor and Method for Manufacturing the Same Public/Granted day:2009-02-05
Information query
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