Invention Grant
- Patent Title: Thin film transistor substrate and method for fabricating the same
- Patent Title (中): 薄膜晶体管基板及其制造方法
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Application No.: US12553780Application Date: 2009-09-03
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Publication No.: US07863086B2Publication Date: 2011-01-04
- Inventor: Bo-sung Kim , Soo-jin Kim , Young-min Kim , Keun-kyu Song , Yong-uk Lee , Mun-pyo Hong , Tae-young Choi , Joon-hak Oh
- Applicant: Bo-sung Kim , Soo-jin Kim , Young-min Kim , Keun-kyu Song , Yong-uk Lee , Mun-pyo Hong , Tae-young Choi , Joon-hak Oh
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR2005-0067517 20050725
- Main IPC: H01L51/40
- IPC: H01L51/40

Abstract:
A thin film transistor substrate includes an insulating substrate, a gate electrode formed on the insulating substrate, a first gate insulating film formed on the gate electrode and having an opening for exposing at least part of the gate electrode, a second gate insulating film covering the gate electrode exposed by the opening and having a larger dielectric constant than the first gate insulating film, a source electrode and a drain electrode disposed apart from each other in a central area of the second gate insulating film and defining a channel region there between, and an organic semiconductor layer formed in the channel region. A method for forming the TFT substrate is also provided. Thus, the present invention provides a TFT substrate in which a characteristic of a TFT is improved.
Public/Granted literature
- US20090317942A1 THIN FILM TRANSISTOR SUBSTRATE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2009-12-24
Information query
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