Invention Grant
- Patent Title: Flat-panel display semiconductor process for efficient manufacturing
- Patent Title (中): 平板显示半导体工艺高效制造
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Application No.: US12331318Application Date: 2008-12-09
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Publication No.: US07863115B2Publication Date: 2011-01-04
- Inventor: Jackson H. Ho , Jeng Ping Lu
- Applicant: Jackson H. Ho , Jeng Ping Lu
- Applicant Address: US CA Palo Alto
- Assignee: Palo Alto Research Center Incorporated
- Current Assignee: Palo Alto Research Center Incorporated
- Current Assignee Address: US CA Palo Alto
- Agency: Blakley Sokoloff Taylor & Zafman
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84
Abstract:
An embodiment is a method and apparatus to fabricate a flat panel display. A poly-last structure is formed for a display panel using an amorphous silicon or amorphous silicon compatible process. The poly-last structure has a channel silicon precursor. The display panel is formed from the poly-last structure using a polysilicon specific or polysilicon compatible process.
Public/Granted literature
- US20100140620A1 FLAT-PANEL DISPLAY SEMICONDUCTOR PROCESS FOR EFFICIENT MANUFACTURING Public/Granted day:2010-06-10
Information query
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