Invention Grant
US07863170B2 Semiconductor body comprising a transistor structure and method for producing a transistor structure 有权
半导体本体包括晶体管结构和用于制造晶体管结构的方法

Semiconductor body comprising a transistor structure and method for producing a transistor structure
Abstract:
A semiconductor body includes a substrate, a buried zone having a first conductivity type that is formed in the substrate, a first zone having the first conductivity type that is above the buried zone, a second zone having a second conductivity type that is different from the first conductivity type and above the first zone, and a third zone having the first conductivity type that is above the second zone. The buried zone includes first and second implantation regions that are formed via first and second implantations that are performed using a mask. The buried zone, the first zone, the second zone and the third zone are parts of a first transistor structure.
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