Invention Grant
- Patent Title: Interposer and method for manufacturing the same
- Patent Title (中): 插件及其制造方法
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Application No.: US11902251Application Date: 2007-09-20
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Publication No.: US07863524B2Publication Date: 2011-01-04
- Inventor: Takeshi Shioga , Kazuaki Kurihara , Kanae Nakagawa , Taiji Sakai , Masataka Mizukoshi
- Applicant: Takeshi Shioga , Kazuaki Kurihara , Kanae Nakagawa , Taiji Sakai , Masataka Mizukoshi
- Applicant Address: JP Kawasaki
- Assignee: Fujitsu Limited
- Current Assignee: Fujitsu Limited
- Current Assignee Address: JP Kawasaki
- Agency: Fujitsu Patent Center
- Priority: JP2006-260548 20060926
- Main IPC: H05K1/16
- IPC: H05K1/16

Abstract:
The interposer includes a glass substrate 46 with first through-electrodes 47 buried in; a plurality of resin layers 68, 20, 32 supported by the glass substrate; thin film capacitors 18a, 18b buried between a first resin layer 68 of the plural resin layers and a second resin layer 20 of the plural resin layers and including the first capacitor electrodes 12a, 12b, the second capacitor electrodes 16 opposed to the first capacitor electrodes 12a, 12b, and a dielectric thin film 14 of a relative dielectric constant of 200 or above formed between the first capacitor electrode 12a, 12b and the second capacitor electrode 16, and the second through-electrodes 77a, 77b penetrating the plural resin layers 68, 20, 32, electrically connected to the first through-electrode 47 and electrically connected to the first capacitor electrode 12a, 12b or the second capacitor electrode 16.
Public/Granted literature
- US20080073110A1 Interposer and method for manufacturing the same Public/Granted day:2008-03-27
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