Invention Grant
- Patent Title: Laser processing apparatus and laser processing method as well as debris extraction mechanism and debris extraction method
- Patent Title (中): 激光加工设备和激光加工方法以及碎屑提取机理和碎片提取方法
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Application No.: US11467388Application Date: 2006-08-25
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Publication No.: US07863542B2Publication Date: 2011-01-04
- Inventor: Hidehisa Murase , Yoshinari Sasaki , Kosei Aso , Naoki Yamada
- Applicant: Hidehisa Murase , Yoshinari Sasaki , Kosei Aso , Naoki Yamada
- Applicant Address: JP Tokyo GB Oxford
- Assignee: Sony Corporation,Exitech Limited
- Current Assignee: Sony Corporation,Exitech Limited
- Current Assignee Address: JP Tokyo GB Oxford
- Agency: K&L Gates LLP
- Priority: JP2005-370488 20051222
- Main IPC: B23K26/16
- IPC: B23K26/16

Abstract:
A laser processing apparatus is provided. The laser processing apparatus is for performing pattern processing of a transparent conductive film that is formed on a multilayer film on a substrate by using laser light, includes debris extraction module having a vortex generation mechanism that generates a vortex flow by directing gas into the vicinity of a laser-irradiated portion of the transparent conductive film. The debris extraction module is disposed close to the substrate, and debris before deposition and after deposition on the substrate, which is generated by laser irradiation, is entrapped into the vortex flow to be extracted to the outside with the gas.
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