Invention Grant
- Patent Title: Focused negative ion beam field source
- Patent Title (中): 聚焦负离子束场源
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Application No.: US12135464Application Date: 2008-06-09
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Publication No.: US07863581B2Publication Date: 2011-01-04
- Inventor: Paulo Lozano , Manuel Martinez-Sanchez
- Applicant: Paulo Lozano , Manuel Martinez-Sanchez
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Proskauer Rose LLP
- Main IPC: H01J27/00
- IPC: H01J27/00

Abstract:
An apparatus for producing negative ions including an emitter coated with an ionic liquid room-temperature molten salt, an electrode positioned downstream relative to the emitter, a power supply that applies a voltage to the emitter with respect to the electrode. The power supply is sufficient to generate a stable high brightness beam of negative ions having minimal chromatic and spherical aberrations in the beam. An electrostatic lens and deflector is used to focus and direct the beam to a target.
Public/Granted literature
- US20090032724A1 FOCUSED NEGATIVE ION BEAM FIELD SOURCE Public/Granted day:2009-02-05
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